ARC-lite

Anti-reflective Coating System For Backside Analysis

ARC-ARC-lite offers fast (less than 1 minute), reliable, room temperature AR coatings on package and some wafer-level devices. The samples produced are NIR optimised and require no subsequent baking. ARC-lite reaches maximum functionality when used with the ASAP-1® System or our ULTRAPOL Advance flat lapping machine, which both produce optimised backside-thinned and polished samples, ready for AR coating.

ARC-lite improves Images at all observation wavelengths from 950nm to 1400nm and beyond. This makes coatings effective for ALL backside microscopy techniques, including photon emission microscopy, laser-scan, thermal and voltage alteration scans, SIFT, FIB etc. The system can also double as a spin-coater for FMI coatings and one-off photoresist layers.

Product Highlights

• Fast and convenient – typically 45 second process
• Up to 30% more transmitted photon efficiency
• Up to 60% improved contrast under NIR
• Bench-top, quiet, room temp. process
• All package types and sizes
• ARC can be done in-house – NO baking
• Optimises emission microscopy, laser, FIB, voltage, thermal and other backside techniques, package, wafer and board-level

Please see below for further details